Synlett 2023; 34(19): 2346-2350
DOI: 10.1055/a-2159-4847
letter

Trimethylsilyl Azide Promoted Shono Oxidation of N,N-Dialkyl Amides

Wenlin Luo
a   Department of Chemistry, Nanchang University, Nanchang, 330031, P. R. of China
,
Ruixing Zhang
a   Department of Chemistry, Nanchang University, Nanchang, 330031, P. R. of China
,
Qi Xu
b   Nursing School of Nanchang University, Nanchang, 330031, P. R. of China
,
Shengyu Zheng
c   Institute for Advanced Study, Nanchang University, Nanchang, 330031, P. R. of China
,
Junpeng Yang
a   Department of Chemistry, Nanchang University, Nanchang, 330031, P. R. of China
,
Meixia Liu
a   Department of Chemistry, Nanchang University, Nanchang, 330031, P. R. of China
,
Shengmei Guo
a   Department of Chemistry, Nanchang University, Nanchang, 330031, P. R. of China
,
Hu Cai
a   Department of Chemistry, Nanchang University, Nanchang, 330031, P. R. of China
› Author Affiliations
We thank the National Science Foundation of China (21861024) for financial support.


Abstract

An alkoxylation of N,N-dialkyl amides by the Shono reaction has been developed that offers a simple and efficient way to access N-adjacent-carbon-substituted amides. TMSN3 plays an essential role in this transformation and permits the reaction to proceed with a broad substrate scope under mild conditions. This reaction proceeds at a lower current compared with the classical method and it affords the products in up to 91% yield. A possible mechanism is proposed based on control experiments.

Supporting Information



Publication History

Received: 24 June 2023

Accepted after revision: 23 August 2023

Accepted Manuscript online:
23 August 2023

Article published online:
04 October 2023

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