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Synlett 1992; 1992(4): 360-362
DOI: 10.1055/s-1992-22015
DOI: 10.1055/s-1992-22015
letter
© Georg Thieme Verlag, Rüdigerstr. 14, 70469 Stuttgart, Germany. All rights reserved. This journal, including all individual contributions and illustrations published therein, is legally protected by copyright for the duration of the copyright period. Any use, exploitation or commercialization outside the narrow limits set by copyright legislation, without the publisher's consent, is illegal and liable to criminal prosecution. This applies in particular to photostat reproduction, copying, cyclostyling, mimeographing or duplication of any kind, translating, preparation of microfilms, and electronic data processing and storage.
Fluorine and Trifluoromethyl Substituted Anilines: Site Selective Metalation and Electrophilic Substitution
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Publikationsverlauf
Publikationsdatum:
08. März 2002 (online)
When treated with tert-butyllithium in tetrahydrofuran at -50 °C, N-BOC (tert-butoxycarbonyt) protected fluoroanilines and trifluoromethylanilines undergo metalation at the nitrogenadjacent position. If, however, the nitrogen carries two alkyl or trimethylsilyl groups as substituents and highly polar metalating reagents such as butyllithium activated by N,N,N′N″,N″-pentamethyldiethylenetriamine (PMDTA) or potassium tert-butoxide are employed, the fluoroaniline derivatives are preferentially deprotonated next to the halogen atom.