Selection of Conditions for the Synthesis of Methacrylate Monomers Based on Adamantane

Abstract

Adamantane-based methacrylates are important monomers for the design of polymers used for the development of chemically amplified photoresists. Herein, we present the selection of reaction conditions for obtaining of 2-ethyladamantan-2-yl methacrylate, 2-methyladamantan-2-yl methacrylate, adamantan-1-yl methacrylate, and 3-hydroxyadamantan-1-yl methacrylate from adamantane derivatives and methacryloyl chloride. It is shown that the combination of pyridine as a solvent and base with 1,4-diazabicyclo[2.2.2]octane (DABCO) as a base allows reproducible preparation of the desired products with good yields. The results obtained provide valuable information for upscaling the synthesis of important products for the microelectronics industry.

Key words

DUV photolithography - photoresist monomers - adamantyl methacrylates - reaction conditions - DABCO - acylation

Publication History

Received: 07 August 2024

Accepted after revision: 24 September 2024

Accepted Manuscript online:
24 September 2024

Article published online:
22 October 2024

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